| 摘要 |
PROBLEM TO BE SOLVED: To provide: a radiation-sensitive resin composition having excellent adhesion to a substrate and photolithographic characteristics; a method for producing a pattern using the radiation-sensitive resin composition; a transparent insulation film obtained by using the radiation-sensitive resin composition; and a display device provided with the transparent insulation film.SOLUTION: A radiation-sensitive resin composition comprises: one or more selected from the group consisting of at least one simple substance of an element selected from the group consisting of La, Ce, Nd, Gd, Ho, Lu, Hf and Ta, an oxide of the elements, a chelate compound of the elements, a salt of the elements and an alloy of the elements; filler having an average particle size of 200 nm or less; an alkali-soluble resin; a polyfunctional monomer; and a photopolymerization initiator. The polyfunctional monomer is preferably one having five functional groups or more. Furthermore, a content of the polyfunctional monomer is preferably 25 to 55 pts.mass relative to 100 pts.mass of the alkali-soluble resin.SELECTED DRAWING: None |
