DIFFUSION FURNACE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a diffusion furnace capable of reducing occurrence of deviation or disturbance in a gas flow in a tube.SOLUTION: A diffusion furnace comprises: a tube including a first opening for carrying in a semiconductor wafer; a plurality of injectors provided facing the first opening and introducing a first gas into the tube; a mass flow controller controlling a flow rate of the first gas introduced by the plurality of injectors; an end lid for lidding the first opening; a plurality of exhaust pipes provided in the end lid and exhausting a gas containing the first gas in the tube to the outside of the tube; an exhaust fan controlling a flow rate of the gas containing the first gas exhausted from the plurality of exhaust pipes; and a heater provided in an outer periphery of the tube and heating the inside of the tube or keeping it warm.SELECTED DRAWING: Figure 1