发明名称 HARD METALLIC MATERIAL POLISHING ABRASIVE GRAIN, POLISHING COMPOSITION, AND HARD METALLIC PRODUCT PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide: an abrasive grain that efficiently polishes a hard metallic material; a polishing composition containing the abrasive grain; and a hard metallic material production method using the composition.SOLUTION: Provided is a hard metallic material polishing abrasive grain which is an abrasive grain for supplying to a polishing surface plate and polishing a hard metallic material, and in which the average particle size is 2 to 10 μm, and the retention rate with respect to the polishing surface plate is 5 to 60%; from a standpoint of polishing efficiency, an abrasive grain substantially composed of a titanium diboride is particularly preferred; a preferred example of a hard metallic material includes a stainless steel.SELECTED DRAWING: None
申请公布号 JP2016069450(A) 申请公布日期 2016.05.09
申请号 JP20140198273 申请日期 2014.09.29
申请人 FUJIMI INC 发明人 MIWA NAOYA;ASHITAKA KEIJI;KOJIMA TAKASHI
分类号 C09K3/14;B24B37/00 主分类号 C09K3/14
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