摘要 |
PROBLEM TO BE SOLVED: To improve yield of a magnetic disk substrate after polishing process.SOLUTION: A manufacturing method of a magnetic disk substrate includes a polishing process for polishing principal surfaces of the substrate by sandwiching the disk shaped substrate with a pair of polishing pads, and making the polishing pads and the substrate relatively slide with each other while supplying slurry containing abrasive grains between the polishing pads and the substrate. Before the polishing process, a gap of 500 μm width or less is formed with absorbent having affinity to the foreign materials higher than the affinity to the abrasive grains, the foreign materials being mixed with the abrasive grains in the slurry, and a removal process for absorbing the foreign materials to a surface of the absorbent to remove the foreign materials from the slurry by passing the slurry through the gap is performed.SELECTED DRAWING: None |