NONPOROUS MOLDED ARTICLE FOR POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD

摘要

Provided is a nonporous molded article for a polishing layer which is a nonporous molded article of a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum loss tangent (tanδ) within a range of -70 to -50˚C of 4.00 x 10-2 or less. Preferably, the thermoplastic polyurethane is obtained by polymerization of a polymer diol having a number-average molecular weight of 650 to 1400, an organic diisocyanate, and a chain extender, and the thermoplastic polyurethane contains 5.7 to 6.5 mass% of nitrogen derived from the isocyanate groups in the organic diisocyanate.