发明名称 VAPOR DELIVERY DEVICE, METHODS OF MANUFACTURE AND METHODS OF USE THEREOF
摘要 A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.
申请公布号 US2016122870(A1) 申请公布日期 2016.05.05
申请号 US201614990843 申请日期 2016.01.08
申请人 Rohm and Haas Electronic Materials LLC 发明人 Woelk Egbert;DiCarlo Ronald L.
分类号 C23C16/455;B01F3/02;B01F15/00;C23C16/448 主分类号 C23C16/455
代理机构 代理人
主权项 1. A method comprising: transporting a first stream of a carrier gas to a delivery device; the delivery device containing a liquid precursor compound; the first stream of carrier gas being at a temperature greater than or equal to 20° C.; where the liquid precursor compound is in a liquid state in the delivery device; transporting a second stream of the carrier gas to a point downstream of the delivery device; wherein a flow direction of the first stream and a flow direction of the second stream are not opposed to each other; and combining the first stream after emanating from the delivery device and the second stream to form a third stream; where a dew point of a vapor of the liquid precursor compound in the third stream is lower than an ambient temperature.
地址 Marlborough MA US