发明名称 Method for charged-particle multi-beam exposure
摘要 In order to irradiate a target with a beam of energetic radiation formed by electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image (pm) composed of a plurality of pixels (pm). The pattern image (pm) is moved along a path on the target over a region to be exposed, and this movement defines a number of stripes (s11, s21) covering said region in sequential exposures and having respective widths (y0) as measured across said main direction. The number of stripes (s11, s21) is written in at least two subsequent passes such that for each pass, the widths (y0) of the stripes of one pass combine into a cover of the total width of the region to be exposed; and each pass is associated with one of a number of partial grids (G1, G2) of pattern pixels which are exposable during the respective pass. The mutually different partial grids (G1, G2) combine to the complete plurality of pattern pixels which compose the region to be exposed.
申请公布号 EP2830083(B1) 申请公布日期 2016.05.04
申请号 EP20140177851 申请日期 2014.07.21
申请人 IMS NANOFABRICATION AG 发明人 PLATZGUMMER, ELMAR
分类号 H01J37/317 主分类号 H01J37/317
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