发明名称 |
Exposure method, exposure apparatus, and method of manufacturing device |
摘要 |
An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step. |
申请公布号 |
US9329489(B2) |
申请公布日期 |
2016.05.03 |
申请号 |
US201313932753 |
申请日期 |
2013.07.01 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Kawanami Kentarou |
分类号 |
G03B27/52;G03B27/68;G03B27/54;G03B27/32;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. An exposure method of illuminating a mask, on which a pattern is formed, using an illumination optical system, and projecting an image of a pattern of the illuminated mask onto a substrate through a projection optical system, the method comprising:
a calculation step of calculating a correction amount of a correction unit which corrects imaging characteristics of the projection optical system based on an amount of change in an environment condition in the projection optical system and a coefficient defining a relationship between the amount of change in the environment condition and the correction amount of the correction unit, wherein the coefficient is a quadratic function of a numerical aperture of the illumination optical system and a numerical aperture of the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step, wherein the calculation step includes: a coefficient value calculating step of calculating a value of the coefficient by substituting values of the numerical aperture of the illumination optical system and the numerical aperture of the projection optical system into the quadratic function; and a correction amount calculation step of calculating the correction amount of the correction unit using the amount of change in the environment condition and the calculated value of the coefficient. |
地址 |
Tokyo JP |