| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound, a resin, a resist composition and etc., with which a resist pattern with an excellent mask error factor is obtainable.SOLUTION: A resist composition containing a compound represented by formula (I), a resin having a structural unit originating from the compound, and an acid generator is disclosed [wherein, each of Rand Rindependently represents a 1-6C aliphatic hydrocarbon group, or Rand Rare bonded to each other and form a 5-20C ring together with carbon atoms to which they are bonded; Rrepresents a group including an ethylenic double bond; W represents a 6-18C divalent alicyclic hydrocarbon group; Trepresents a single bond, a 1-6C divalent aliphatic hydrocarbon group, etc.; Trepresents a 1-6C divalent aliphatic hydrocarbon group, etc.]. |
