Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective mask

摘要

Disclosed is a method for producing a substrate with a multilayer reflective film for EUV lithography including a multilayer reflective film disposed on a principal surface of a substrate, the method including a multilayer reflective film formation step of forming the multilayer reflective film on the principal surface of the substrate in such a manner that the multilayer reflective film has a slope region in which the film thickness is decreased in a direction from the inside to the outside of the substrate on a peripheral portion of the principal surface, and a fiducial mark formation step of forming fiducial marks in the slope region by removing at least a portion of the multilayer reflective film, the fiducial marks serving as references for a defective location indicated by defect information with respect to the surface of the substrate with the multilayer reflective film.

主权项

1. A reflective mask including a multilayer reflective film disposed on a principal surface of a substrate and an absorber film pattern disposed on the multilayer reflective film, the multilayer reflective film including higher refractive index layers and lower refractive index layers alternately stacked on top of one another, wherein the multilayer reflective film comprises:
a slope region in which the film thickness is decreased in a direction from the inside to the outside of the substrate on a peripheral portion of the principal surface, and fiducial marks formed in the slope region by removing at least a portion of the multilayer reflective film, the fiducial marks serving as references for a defective location indicated by defect information with respect to the surface of a reflective mask blank or by defect information with respect to the surface of the substrate with the multilayer reflective film.