发明名称 Low-contamination optical arrangement
摘要 An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor.
申请公布号 US9316930(B2) 申请公布日期 2016.04.19
申请号 US201113023840 申请日期 2011.02.09
申请人 Carl Zeiss SMT GmbH 发明人 Kwan Yim-Bun Patrick;Xalter Stefan
分类号 G03B27/54;G03F7/20 主分类号 G03B27/54
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A system, comprising: an optical arrangement, comprising: a plurality of optical elements including a first optical element, each of the plurality of optical elements comprising a body and a reflective surface supported by the body, the plurality of optical elements configured to transmit a beam along a beam path; anda first partial housing extending from the reflective surface of the first optical element into a direction of a first portion of the beam which is incident on and/or reflected from the reflective surface of the first optical element; anda measurement structure which does not support the plurality of optical elements, the measurement structure comprising a sensor configured to determine a position and/or an orientation of the first optical element relative to the measurement structure, wherein: the first partial housing surrounds the first portion of the beam;the first partial housing surrounds the reflective surface of the first optical element such that there is a gap between the first partial housing and the body of the first optical element;the first partial housing is constructed to fully support the first optical element by a first mounting;the measurement structure at least partly surrounds the first partial housing;the first optical element has a reference surface;a distance between the reference surface of the first optical element and the sensor is at most 50 millimeters; andthe system is an EUV projection exposure system.
地址 Oberkochen DE
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