发明名称 |
Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate |
摘要 |
The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed. |
申请公布号 |
US9316903(B2) |
申请公布日期 |
2016.04.19 |
申请号 |
US201414500240 |
申请日期 |
2014.09.29 |
申请人 |
Nanjing University |
发明人 |
Chen Yanfeng;Ge Haixiong;Li Zhiwei;Yuan Changsheng;Lu Minghui |
分类号 |
B29C59/00;G03F1/76;B29C33/40;B82Y10/00;B82Y40/00;G03F7/00;B05D1/00;B29C59/02;G03F7/20;B29K83/00 |
主分类号 |
B29C59/00 |
代理机构 |
Chen Yoshimura LLP |
代理人 |
Chen Yoshimura LLP |
主权项 |
1. A method of fabricating a flexible imprint mold, comprising:
(a) preparing a polymer elastic support, which has a thickness from 0.1 mm to 3 mm and a tensile modulus from 1 to 15 N/mm2; (b) forming a film of a silicon containing photo-curable material on a mold master; (c) placing the polymer elastic support onto the mold master; (d) using a UV radiation to cure the silicon containing photo-curable material in a nitrogen atmosphere to form a rigid patterning feature layer, which has a tensile modulus of more than 20 N/mm2 and a thickness from 30 nm to 500 nm; (e) removing the polymer elastic support and the rigid patterning feature layer from the mold master; and (f) oxidizing a near-surface region of the rigid patterning feature layer into silica. |
地址 |
Nanjing CN |