发明名称 |
SUBSTRATE TRANSFER SYSTEM HAVING IONIZER |
摘要 |
A substrate transfer system includes a substrate transfer chamber between a substrate receiving port and a process chamber, the substrate transfer chamber providing a space for transferring a substrate between the substrate receiving port and the process chamber, and an ionizer within the substrate transfer chamber, the ionizer including a light source to irradiate electromagnetic waves having a predetermined radiation angle toward the substrate to eliminate static electricity of the substrate. |
申请公布号 |
US2016099086(A1) |
申请公布日期 |
2016.04.07 |
申请号 |
US201514729419 |
申请日期 |
2015.06.03 |
申请人 |
LEE Jae-Wook;JUNG Ho-Hyung;BAEK Kye-Hyun |
发明人 |
LEE Jae-Wook;JUNG Ho-Hyung;BAEK Kye-Hyun |
分类号 |
G21K5/08;H01L21/66;H01L21/67;H01L21/68;H01J37/28;H01L21/677 |
主分类号 |
G21K5/08 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate transfer system, comprising:
a substrate transfer chamber between a substrate receiving port and a process chamber, the substrate transfer chamber providing a space for transferring a substrate between the substrate receiving port and the process chamber; and an ionizer within the substrate transfer chamber, the ionizer including a light source to irradiate electromagnetic waves having a predetermined radiation angle toward the substrate to eliminate static electricity of the substrate. |
地址 |
Hwaseong-si KR |