发明名称 |
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a salt from which a resist pattern with good line edge roughness (LER) can be produced.SOLUTION: The salt has a group represented by formula (a). In formula (a), Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent group having an alicyclic hydrocarbon group, in which a methylene group included in the divalent group having an alicyclic hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, and a hydrogen atom included in the divalent group having an alicyclic hydrocarbon group may be replaced by a hydroxy group or a fluorine tome; and * represents a binding site.SELECTED DRAWING: None |
申请公布号 |
JP2016047815(A) |
申请公布日期 |
2016.04.07 |
申请号 |
JP20150164499 |
申请日期 |
2015.08.24 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
MASUYAMA TATSURO;FUJITA SHINGO;ICHIKAWA KOJI |
分类号 |
C07D317/72;C07D319/08;C07D327/06;C07D407/14;C09K3/00;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
C07D317/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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