发明名称 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a salt from which a resist pattern with good line edge roughness (LER) can be produced.SOLUTION: The salt has a group represented by formula (a). In formula (a), Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent group having an alicyclic hydrocarbon group, in which a methylene group included in the divalent group having an alicyclic hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, and a hydrogen atom included in the divalent group having an alicyclic hydrocarbon group may be replaced by a hydroxy group or a fluorine tome; and * represents a binding site.SELECTED DRAWING: None
申请公布号 JP2016047815(A) 申请公布日期 2016.04.07
申请号 JP20150164499 申请日期 2015.08.24
申请人 SUMITOMO CHEMICAL CO LTD 发明人 MASUYAMA TATSURO;FUJITA SHINGO;ICHIKAWA KOJI
分类号 C07D317/72;C07D319/08;C07D327/06;C07D407/14;C09K3/00;G03F7/004;G03F7/038;G03F7/039 主分类号 C07D317/72
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