发明名称 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM
摘要 A chemically amplified negative resist composition comprising a silicone structure-bearing polymer forms a film which can be readily patterned. The patterned film is tightly adherent to various substrates and suited as protective film on electric/electronic parts because of improved alkali resistance and reliability.
申请公布号 US2016097974(A1) 申请公布日期 2016.04.07
申请号 US201514862736 申请日期 2015.09.23
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Asai Satoshi;Takemura Katsuya;Soga Kyoko
分类号 G03F7/075;G03F7/40;G03F7/38;G03F7/32;G03F7/16;G03F7/20 主分类号 G03F7/075
代理机构 代理人
主权项 1. A chemically amplified negative resist composition comprising (A) a silicone structure-bearing polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 3,000 to 500,000,wherein R1 to R4 are each independently a monovalent C1-C8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each independently 0 or a positive number, a+b>0, and a+b+c+d=1, X is a divalent organic group having the general formula (2):wherein W is a divalent organic group selected from the following:n is 0 or 1, R5 and R6 are each independently a C1-C4 alkyl or alkoxy group, k is independently 0, 1 or 2, Y is a divalent organic group having the general formula (3):wherein V is a divalent organic group selected from the following:p is 0 or 1, R7 and R8 are each independently a C1-C4 alkyl or alkoxy group, h is independently 0, 1 or 2, (B) at least one compound selected from polyhydric phenols having at least three hydroxyl groups, (C) a photoacid generator which is decomposed to generate an acid upon exposure to radiation of wavelength 190 to 500 nm, and (D) a solvent.
地址 Tokyo JP