Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

摘要

A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput.

主权项

1. An illumination optics, comprising:
a field facet mirror comprising a plurality of arcuate field facets, each arcuate field facet comprising a reflection surface; an optics comprising a transmission facet mirror configured to image the field facets into an object field during use of the illumination optics, wherein:
the transmission facet mirror comprises a plurality of transmission facets;each field facet is allocated an individually allocated transmission facet to image into the object field during use of the illumination system;the transmission facets are oriented so that, during use of the illumination system, centers of the reflection surfaces of the field facets are imaged on an extended region in the center of the object field; andthe illumination optics is a microlithography illumination optics.