POLISHING PAD AND METHOD FOR MAKING THE SAME

摘要

The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a plurality of first trenches. The first trench has an opening at the first surface. The polishing layer is located on the first surface of the base layer and fills the first trenches. The polishing layer has a plurality of second trenches, the positions of the second trenches correspond to those of the first trenches, and the depth of the second trenches is less than that of the first trenches.

主权项

1. A polishing pad, comprising:
a base layer having a first surface, a second surface, and a plurality of first trenches, wherein the first trench has an opening at the first surface; and a polishing layer located on the first surface of the base layer and filling the first trenches, the polishing layer having a plurality of second trenches, the positions of the second trenches corresponding to those of the first trenches, and the depth of the second trenches being less than that of the first trenches.