| 发明名称 |
METHOD FOR COATING A SUBSTRATE WITH A LACQUER AND DEVICE FOR PLANARISING A LACQUER LAYER |
| 摘要 |
The disclosure relates to a method for coating a substrate with a lacquer. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarising a lacquer layer. |
| 申请公布号 |
US2016089693(A1) |
申请公布日期 |
2016.03.31 |
| 申请号 |
US201514861105 |
申请日期 |
2015.09.22 |
| 申请人 |
SUSS MicroTec Lithography GmbH |
发明人 |
Fischer Katrin;Palitschka Florian;Platen Johannes;Kaneko Kento |
| 分类号 |
B05D3/00;B05D1/02 |
主分类号 |
B05D3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for coating a substrate with a lacquer, comprising the steps of:
uniformly applying the lacquer to the substrate; reducing a solvent proportion of the lacquer applied to the substrate; and thereafter, exposing the substrate to a solvent atmosphere. |
| 地址 |
Garching DE |
