发明名称 |
PELLICLE FRAME AND PELLICLE |
摘要 |
The purpose of the present invention is to provide a pellicle frame which is easy to produce and handle and causing little distortion on a photomask after installation. The present invention also provides a pellicle. The pellicle frame of the present invention comprises a pellicle frame main body having a frame shape; a vertical projection part having the thickness which is 5-30% of the width of the pellicle frame main body along an inner surface of the pellicle frame main body from the side facing the side on which a pellicle membrane of the pellicle frame main body is tensionally installed; and a horizontal projection part having the thickness of 0.3-1 mm and being horizontal to the side on which the pellicle membrane is tensionally installed toward the outside from an end of the vertical projection part. |
申请公布号 |
KR20160034800(A) |
申请公布日期 |
2016.03.30 |
申请号 |
KR20150116608 |
申请日期 |
2015.08.19 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SEKIHARA KAZUTOSHI |
分类号 |
G03F1/64;G03F1/62 |
主分类号 |
G03F1/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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