发明名称 PELLICLE FRAME AND PELLICLE
摘要 The purpose of the present invention is to provide a pellicle frame which is easy to produce and handle and causing little distortion on a photomask after installation. The present invention also provides a pellicle. The pellicle frame of the present invention comprises a pellicle frame main body having a frame shape; a vertical projection part having the thickness which is 5-30% of the width of the pellicle frame main body along an inner surface of the pellicle frame main body from the side facing the side on which a pellicle membrane of the pellicle frame main body is tensionally installed; and a horizontal projection part having the thickness of 0.3-1 mm and being horizontal to the side on which the pellicle membrane is tensionally installed toward the outside from an end of the vertical projection part.
申请公布号 KR20160034800(A) 申请公布日期 2016.03.30
申请号 KR20150116608 申请日期 2015.08.19
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SEKIHARA KAZUTOSHI
分类号 G03F1/64;G03F1/62 主分类号 G03F1/64
代理机构 代理人
主权项
地址