发明名称 FLEXIBLE DISPLAY PANEL AND ELECTRO-OPTICAL APPARATUS
摘要 A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.
申请公布号 US2016087020(A1) 申请公布日期 2016.03.24
申请号 US201514958894 申请日期 2015.12.03
申请人 Au Optronics Corporation 发明人 Chwu Jong-Wen;Lin Chao-Cheng;Wu Che-Yao;Liu Yu-Chen;Yang Wei-Chieh
分类号 H01L27/32;G02F1/1333;G02F1/1368;G02F1/1362;H01L51/00;H01L51/52 主分类号 H01L27/32
代理机构 代理人
主权项 1. A flexible display panel, comprising: a first flexible substrate, having a first etching stop layer and an active layer disposed thereon, wherein the material of the first etching stop layer comprises polyamide or silicon-rich dielectric material, the active layer comprises a plurality of scan lines, a plurality of data lines, a plurality of thin film transistors, and a plurality of pixel electrodes, wherein the thin film transistors are electrically connected to the corresponding scan lines and data lines, the pixel electrodes are electrically connected to the corresponding thin film transistors, and the first etching stop layer is disposed underneath the active layer and disposed between the active layer and the first flexible substrate; a second flexible substrate, having a second etching stop layer and a cover layer disposed thereon, wherein the material of the second etching stop layer comprises polyamide or silicon-rich dielectric material, the second etching stop layer is in contact with the second flexible substrate, and the cover layer at least comprises a color filter layer, the second etching stop layer and the cover layer are sequentially disposed on an inner surface of the second flexible substrate, and the second etching stop layer is sandwiched between the second flexible substrate and the cover layer; and a display media, disposed between the first flexible substrate and the second flexible substrate.
地址 Hsinchu TW