PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

In an inductively-coupled plasma torch unit, a coil, a first ceramic block, and a second ceramic block are arranged, parallel to one another, and an elongated chamber has an annular shape. Plasma generated inside the chamber is ejected toward a substrate through an opening portion in the chamber. The substrate is processed by relatively moving the elongated chamber and the substrate in a direction perpendicular to a longitudinal direction of the opening portion. A rotating ceramic pipe having a cylindrical shape is provided so as to cause a refrigerant to flow into a cavity formed inside the ceramic pipe. Accordingly, it becomes possible to apply greater high-frequency power, thereby enabling fast plasma processing.

主权项

1. A plasma processing apparatus which uses an inductively-coupled plasma torch, comprising:
an elongated and annular chamber that is surrounded with a dielectric member except for an opening portion, and that communicates with the opening portion; a gas supply pipe that introduces gas into the chamber; a coil that is disposed in the vicinity of the chamber; a high-frequency power source that is connected to the coil; and a substrate mounting table, wherein within the dielectric member surrounding the chamber, a portion configuring a surface which opposes the substrate mounting table is configured to include a cylinder arranged parallel to a longitudinal direction of the chamber.