| 发明名称 |
SEMICONDUCTOR INSPECTION SYSTEM AND METHODS OF INSPECTING A SEMICONDUCTOR DEVICE USING THE SAME |
| 摘要 |
A semiconductor inspection system including an ion beam milling unit configured to irradiate at least one cluster-ion beam onto a surface of a sample wafer and etch the surface of the sample wafer and an image acquisition unit configured to irradiate an electron beam onto the etched surface of the sample wafer and acquire an image of the etched surface may be provided. |
| 申请公布号 |
US2016086769(A1) |
申请公布日期 |
2016.03.24 |
| 申请号 |
US201514828021 |
申请日期 |
2015.08.17 |
| 申请人 |
KIM Hyunwoo;KO Wooseok;KIM Minkook;KIM Jung Hwan;YANG Yusin;LEE Sangkil;JUN Chungsam |
发明人 |
KIM Hyunwoo;KO Wooseok;KIM Minkook;KIM Jung Hwan;YANG Yusin;LEE Sangkil;JUN Chungsam |
| 分类号 |
H01J37/30;H01J37/285;H01J37/28;H01J37/305 |
主分类号 |
H01J37/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A semiconductor inspection system, comprising:
an ion beam milling unit configured to irradiate at least one cluster-ion beam onto a surface of a sample wafer and etch the surface of the sample wafer; and an image acquisition unit configured to irradiate an electron beam onto the etched surface of the sample wafer and acquire an image of the etched surface. |
| 地址 |
Chungju-si KR |
