发明名称 MICROLENS ARRAY SUBSTRATE
摘要 A microlens substrate has a tendency to warp when an oxide film is formed and annealed before forming a mask in order to adjust the etching rate of wet etching. A film exerting a stress that cancels out this warping may be formed upon a microlens. This film functions as an optical path length adjusting layer.
申请公布号 US2016084997(A1) 申请公布日期 2016.03.24
申请号 US201514961844 申请日期 2015.12.07
申请人 Seiko Epson Corporation 发明人 Akasaka Koichiro
分类号 G02B3/00;G02B5/00 主分类号 G02B3/00
代理机构 代理人
主权项 1. A microlens array substrate comprising: a substrate; an oxide film that has an aspheric-surfaced recess is disposed on the substrate, the aspheric-surfaced recess has a tapered edge; a microlens that has a higher refractive index than the substrate is disposed in the aspheric-surfaced recess, the microlens has a convex surface side and flat surface side opposite the convex surface side; and an optical path length adjusting layer is disposed on the flat surface side of the microlens, wherein the substrate is warped in a concave shape by stress from at least one of the oxide film or the microlens, the optical path length adjusting layer includes a first film and a second film, the first film receives a compressive stress in a direction orthogonal to a normal direction of the substrate, and the second film receives a tensile stress in the direction orthogonal to the normal direction of the substrate.
地址 Tokyo JP