| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material having high sensitivity.SOLUTION: A resist pattern material of the present invention comprises a resist composition containing a base resin and a sensitizer precursor. The resist composition generates a sensitizer by irradiation with a first energy beam. When the resist composition not irradiated with the first energy beam is irradiated with a second energy beam that accelerates a resist reaction by the sensitizer, the resist composition does not generate the sensitizer.SELECTED DRAWING: None |
