发明名称 |
WIRING BOARD PROVIDED WITH THROUGH ELECTRODE, METHOD FOR MANUFACTURING SAME AND SEMICONDUCTOR DEVICE |
摘要 |
A manufacturing method for forming a wiring board provided with a through electrode includes steps of: a step for forming, to a first layer, a wiring layer and a portion for a land where the through electrode is provided, the wiring and the portion for the land being formed in glass; a step for forming a metal layer on only a front surface of the glass; a step for forming a through hole in the glass only at a portion between the land where the through electrode of the back surface is provided and the land corresponding to the front surface thereof; a step for filling the through hole with a conductive material; a step for forming a metal layer on the back surface; and a step for polishing the metal layer on the front and back surfaces of the glass until a glass surface is exposed. |
申请公布号 |
US2016079149(A1) |
申请公布日期 |
2016.03.17 |
申请号 |
US201514953137 |
申请日期 |
2015.11.27 |
申请人 |
Toppan Printing Co., Ltd. |
发明人 |
YOSHIDA Tomohiro |
分类号 |
H01L23/498;H01L23/00;H05K1/03;H05K3/46;H05K1/11;H05K3/10;H05K3/24;H05K3/26;H01L21/48;H05K1/09 |
主分类号 |
H01L23/498 |
代理机构 |
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代理人 |
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主权项 |
1. A wiring board provided with a through electrode, comprising:
a wiring board that is multi-layered, having glass as a base material, and having a through electrode provided in the glass, and, a wiring layer, wherein the wiring layer and the through electrode are provided in a first layer of front and back surfaces of the base material and are formed in the glass. |
地址 |
Tokyo JP |