发明名称 WIRING BOARD PROVIDED WITH THROUGH ELECTRODE, METHOD FOR MANUFACTURING SAME AND SEMICONDUCTOR DEVICE
摘要 A manufacturing method for forming a wiring board provided with a through electrode includes steps of: a step for forming, to a first layer, a wiring layer and a portion for a land where the through electrode is provided, the wiring and the portion for the land being formed in glass; a step for forming a metal layer on only a front surface of the glass; a step for forming a through hole in the glass only at a portion between the land where the through electrode of the back surface is provided and the land corresponding to the front surface thereof; a step for filling the through hole with a conductive material; a step for forming a metal layer on the back surface; and a step for polishing the metal layer on the front and back surfaces of the glass until a glass surface is exposed.
申请公布号 US2016079149(A1) 申请公布日期 2016.03.17
申请号 US201514953137 申请日期 2015.11.27
申请人 Toppan Printing Co., Ltd. 发明人 YOSHIDA Tomohiro
分类号 H01L23/498;H01L23/00;H05K1/03;H05K3/46;H05K1/11;H05K3/10;H05K3/24;H05K3/26;H01L21/48;H05K1/09 主分类号 H01L23/498
代理机构 代理人
主权项 1. A wiring board provided with a through electrode, comprising: a wiring board that is multi-layered, having glass as a base material, and having a through electrode provided in the glass, and, a wiring layer, wherein the wiring layer and the through electrode are provided in a first layer of front and back surfaces of the base material and are formed in the glass.
地址 Tokyo JP