| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film exposure device in which degradation of formation accuracy of a polarization portion caused by vertical vibration of a thin film is prevented and occurence of wrinkling can be prevented, and that is capable of obtaining a polarization film of which a polarization portion is formed with high accuracy. <P>SOLUTION: A film 10 with an alignment material applied thereon is wound around a back roll 5 and is then fed to a winder of a polarization film. The film 10 is supported with wrinkling being stretched by the back roll 5. In a moving region of the film, a mask 7 and a slit mask 17 are arranged. Through an aperture of the mask 7, exposure light of CW circular polarization from an exposure light source 6 is projected on almost all of a surface of the film 10, and through a plurality of slits of the slit mask 17, exposure light of CCW circular polarization from an exposure light source 16 is projected in a strip shape on the film 10. <P>COPYRIGHT: (C)2013,JPO&INPIT |
