ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

Provided are: an active light sensitive or radiation sensitive resin composition having excellent sensitivity; an active light sensitive or radiation sensitive film using the active light sensitive or radiation sensitive resin composition; a pattern forming method; and a method for manufacturing an electronic device. The active light sensitive or radiation sensitive resin composition contains a resin (Ab), the polarity of which is changed by the action of an acid, and a compound that generates an acid when irradiated with active light or radiation. The resin (Ab) contains metal ions, and the metal species of the metal ions is at least one of the metal species belonging to groups 1-10 and 13-16 (excluding Mg and Cs).