| 发明名称 |
PATTERN DIMENSION CALCULATION METHOD, SIMULATION APPARATUS, COMPUTER-READABLE RECORDING MEDIUM AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE |
| 摘要 |
According to an embodiment, a pattern dimension calculation method includes setting a reference point on a first circuit pattern, calculating, as a size of area of an opposing pattern, a size of area of a range corresponding to the reference point of a second circuit pattern opposite to the reference point, and calculating a dimension of the first circuit pattern in accordance with the size of area of the opposing pattern. |
| 申请公布号 |
US2016070847(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201514625031 |
申请日期 |
2015.02.18 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TAGUCHI Takafumi;ICHIKAWA Takashi;MURAKAMI Sadatoshi;SUZUKI Norihisa |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pattern dimension calculation method comprising:
setting a reference point on a first circuit pattern; calculating, as a size of area of an opposing pattern, a size of area of a range corresponding to the reference point of a second circuit pattern opposite to the reference point; and calculating a dimension of the first circuit pattern in accordance with the size of area of the opposing pattern. |
| 地址 |
Minato-ku JP |
