| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method which enables the achievement of an increased cleaning effect in comparison to that in the past while a substrate subjected to an etching process is cleaned with a polymer-removal liquid as in the past.SOLUTION: In a substrate processing apparatus (1) (as well as a substrate processing method, and a computer-readable storage medium with a substrate processing program stored therein) arranged so that a substrate (3) subjected to an etching process is cleaned with a polymer-removal liquid, the substrate (3) is supplied with any one of isopropyl alcohol vapor, water vapor, pure water and isopropyl alcohol, ammonia water, or a combination of ammonia water and isopropyl alcohol before cleaning the substrate (3) with the polymer-removal liquid.SELECTED DRAWING: Figure 2 |
