| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus that can align a substrate with high accuracy and high throughput, and can align a wafer at an exposure position with high accuracy upon exposure.SOLUTION: In a detection operation of a mark by an alignment system (AL1, AL2to AL2), a controller controls a drive system of a stage WST in such a manner that, in order to detect a plurality of marks on a wafer W, which are at different positions with regard to a Y direction orthogonal to an X direction within an XY plane, in at least a part of detection regions of the alignment system (AL1, AL2to AL2), the wafer W is relatively moved in the Y direction with respect to a plurality of detection regions; and in an exposure operation on the wafer W, the controller uses detection information of the marks by the alignment system.SELECTED DRAWING: Figure 29 |
