STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND STRIPPING METHOD OF PHOTORESIST USING THE SAME

摘要

The present invention relates to a stripper composition for removing photoresist, which comprises: at least one sort of amine compounds; an amide-based compound mono- or di-substituted with a linear or branched alkyl group with 1-5 carbon atoms on nitrogen; a polar organic solvent; a specific triazole-based compound; and a benzimidazole-based compound. The present invention further relates to a method for stripping the photoresist using the same. According to the present invention, the composition has outstanding stripping and rinsing ability for the photoresist.