| 摘要 |
A chemical amplified photoresist composition containing a resin, an acid generator, and a compound of formula (X): wherein R1a, R2a, R3a, R6a, R7a and R8a each independently represent a hydrogen atom, a hydroxyl group, a carboxy group, —SO3, —NH2, a halogen atom, a mercapto group, a C1-C12 alkyl group optionally having a substituent, a C6-C30 aryl group optionally having a substituent, a C3-C12 cycloalkyl group optionally having a substituent, and R4a and R5a each independently represent a hydrogen atom, a hydroxyl group, a carboxy group, —SO3, —NH2, a halogen atom, a mercapto group, a C1-C12 alkyl group optionally having a substituent, a C6-C30 aryl group optionally having a substituent, or a C3-C12 cycloalkyl group optionally having a substituent, or R4a and R5a are bonded each other to form a ring together with carbon atoms binding R4a and R5a and with the carbon atoms forming the bond between the pyridine rings. |
