发明名称 ベンゾトリアゾール化合物及びこれを用いた化粧用紫外線吸収剤と皮膚外用剤
摘要 PROBLEM TO BE SOLVED: To provide a novel compound exhibiting, despite having a low melting point, compatibility with various cosmetic bases, absorbing rays over nearly entire regions of UV-A and UV-B, excellent in terms of light stability, exhibiting long-term decomposition resistance and degradation resistance due to both an ultraviolet absorption function and a matrix metal proteinase (MMP) inhibition activity function inherent in the compound, and usable as a hybrid material for doubly protecting skin from aging damages and effective components of skin external preparations useful as MMP inhibitors and having scarce side effects.SOLUTION: The provided 2-(2,4-dihydroxyphenyl)-2H-benzotriazole derivative is expressed by the following general formula 1.
申请公布号 JP5875576(B2) 申请公布日期 2016.03.02
申请号 JP20130273858 申请日期 2013.12.20
申请人 シプロ化成株式会社 发明人 田中 直樹;坪井 誠二;守谷 智恵;佐々木 健二
分类号 C07D249/20;A61K8/49;A61K31/4192;A61K31/454;A61K31/5377;A61P17/16;A61Q17/04;C07D403/12 主分类号 C07D249/20
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