Liquid processing apparatus, liquid processing method, and storage medium

摘要

A liquid processing apparatus of the present disclosure includes a rotatable substrate holder that holds a wafer from above, and a top plate nozzle that supplies at least rinse liquid to the wafer and is provided in the rotation center of the substrate holder. The top plate nozzle is movably configured with the substrate holder in the top-bottom direction, and the rinse liquid is supplied to the wafer from the top plate nozzle while the top plate nozzle is spaced from the substrate holder. When the top plate nozzle approaches to the substrate holder, the rinse liquid is supplied to the lower surface of the substrate holder from the top plate nozzle to clean the lower surface of the substrate holder.

主权项

1. A liquid processing apparatus comprising:
a cover plate configured to cover a substrate from above; a cover plate rotating mechanism configured to rotate the cover plate; a nozzle including a first discharging port provided in the rotational center portion of the cover plate and configured to supply a rinse liquid toward the substrate, and a second discharging port configured to supply a rinse liquid radially toward the cover plate; and a nozzle driving unit configured to move the nozzle to an ascending position and a descending position with respect to the cover plate, wherein the nozzle supplies the rinse liquid toward the cover plate from the second discharging port at the ascending position and supplies the rinse liquid toward the substrate from the first discharging port at the descending position, and the nozzle is a cylindrical body having a lower flange, and the lower flange is provided with the first discharging port and the second discharging port.