STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND METHOD FOR PEELING OFF PHOTORESIST EMPLOYING SAME.

摘要

The present invention relates to a stripper composition for removing photoresist and a method for peeling off photoresist employing the same, the stripper composition comprising: a chain amine compound having a weight average molecular weight of 95 g/mol or more; a chain amine compound having a weight average molecular weight of 90 g/mol or less; a cyclic amine compound; an amide-based compound in which a straight-chain or branched chain alkyl group having 1 to 5 carbon atoms is mono- or di-substituted by nitrogen; and a polar organic solvent, wherein the weight ratio between the chain amine compound having a weight average molecular weight of 95 g/mol or more and the chain amine compound having a weight average molecular weight of 90 g/mol or less is 1:1 to 1:10.