发明名称 Positive photosensitive resin composition, photosensitive resin layer prepared by using the same, and semiconductor device including the photosensitive resin layer
摘要 Provided is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by Chemical Formula 1 and a repeating unit represented by Chemical Formula 2, and having a thermally polymerizable functional group at least one terminal end; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. A photosensitive resin film fabricated using the positive photosensitive resin composition is provided.
申请公布号 US9268221(B2) 申请公布日期 2016.02.23
申请号 US201113190690 申请日期 2011.07.26
申请人 Cheil Industries Inc. 发明人 Jeong Ji-Young;Chung Min-Kook;Lee Jong-Hwa;Im Mi-Ra;Cho Hyun-Yong;Cha Myoung-Hwan;Cheon Hwan-Sung
分类号 G03F7/023;G03F7/075;G03F7/40 主分类号 G03F7/023
代理机构 Additon, Higgins & Pendleton, P.A. 代理人 Additon, Higgins & Pendleton, P.A.
主权项 1. A positive photosensitive resin composition, comprising: (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and a repeating unit represented by the following Chemical Formula 32 and having a thermally polymerizable functional group at least one terminal end; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent: wherein in Chemical Formulae 1, 2, and 32, X1 is the same or different in each repeating unit and is each independently a substituted or unsubstituted C6 to C30 aromatic organic group, a substituted or unsubstituted tetravalent to hexavalent C1 to C30 aliphatic organic group, or a substituted or unsubstituted tetravalent to hexavalent C3 to C30 alicyclic organic group, X2 is the same or different in each repeating unit and is each independently a functional group represented by the following Chemical Formula 6 and 9 to 13 or a combination thereof: wherein in Chemical Formulae 6 and 9 to 13, R6, R7, R13, R15 and R17 are the same or different in each repeating unit and are each independently hydrogen, fluorine, hydroxy, thiol, substituted or unsubstituted C1 to C30 carboxyl, or a substituted or unsubstituted C1 to C30 aliphatic organic group, R8, R14, R16, R18, R20 are the same or different in each repeating unit and are each independently hydrogen, substituted or unsubstituted C1 to C30 alkyl, substituted or unsubstituted C1 to C30 carboxyl, hydroxy, or thiol, n9, n11 and n13 are each independently integers ranging from 1 to 5, and n6, n10, n12, n14, n15 and n16 are each independently integers ranging from 0 to 3, X3 is the same or different in each repeating unit and is each independently an aromatic organic group or an alicyclic organic group derived from an aromatic diamine or an alicyclic diamine selected from the group consisting of 3,4′-diamianodiphenylether, 4,4′-diaminodiphenylether, 3,4′-diaminodiphenylemthane, 4,4′-diaminodiphenylmethane, 4,4′-diaminodipheylsulfone, 4,4′-diaminodiphenylsulfide, benzidine, m-phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, bis(4-aminophenoxyphenyl)sulfone, bis(3-aminophenoxyphenyl) sulfone, bis(4-aminophenoxy)biphenyl, bis[4-(4-aminophenoxy)phenyl]ether, 1,4-bis(4-aminophenoxy)benzene, compounds including an aromatic ring of the foregoing amines substituted with an alkyl group or a halogen, 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, 1,2-diaminocyclohexane, 4,4′methtlenebiscyclohexylamine, 4,4′-methylenebis(2-methylcyclohexylamine), and combinations thereof, and Y1, Y2, and Y3 are the same or different in each repeating unit and are each independently a substituted or unsubstituted C6 to C30 aromatic organic group, a substituted or unsubstituted divalent to hexavalent C1 to C30 aliphatic organic group, or a substituted or unsubstituted divalent to hexavalent C3 to C30 alicyclic organic group, wherein the first polybenzoxazole precursor comprises about 5 parts by mole to about 40 parts by mole of the repeating unit reoresented by Chemical Formula 2 and about 5 parts by mole to about 40 parts by mole of the repeating unit represented by Chemical Formula 32, based on 100 parts by mole of the repeating unit represented by Chemical Formula 1.
地址 Gumi-si KR