发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device includes a pipe gate, word lines stacked on the pipe gate, first channel layers configured to pass through the word lines, and a second channel layer formed in the pipe gate to connect the first channel layers and having a higher impurity concentration than the first channel layers.
申请公布号 US9269719(B2) 申请公布日期 2016.02.23
申请号 US201213718840 申请日期 2012.12.18
申请人 SK Hynix Inc. 发明人 Lee Ki Hong;Pyi Seung Ho;Bin Jin Ho
分类号 H01L27/115;H01L29/78;H01L29/792;H01L29/66;H01L27/108 主分类号 H01L27/115
代理机构 William Park & Associates Ltd. 代理人 William Park & Associates Ltd.
主权项 1. A semiconductor device comprising: a conductive layer; a plurality of word lines stacked on the conductive layer; a plurality of first channel layers configured to pass through the word lines; and a second channel layer formed in the conductive layer to connect the plurality of first channel layers, and having a higher impurity concentration than the plurality of first channel layers, wherein the conductive layer is configured to surround side and lower surfaces of the second channel layer.
地址 Gyeonggi-do KR