发明名称 |
Semiconductor device and method of manufacturing the same |
摘要 |
A semiconductor device includes a pipe gate, word lines stacked on the pipe gate, first channel layers configured to pass through the word lines, and a second channel layer formed in the pipe gate to connect the first channel layers and having a higher impurity concentration than the first channel layers. |
申请公布号 |
US9269719(B2) |
申请公布日期 |
2016.02.23 |
申请号 |
US201213718840 |
申请日期 |
2012.12.18 |
申请人 |
SK Hynix Inc. |
发明人 |
Lee Ki Hong;Pyi Seung Ho;Bin Jin Ho |
分类号 |
H01L27/115;H01L29/78;H01L29/792;H01L29/66;H01L27/108 |
主分类号 |
H01L27/115 |
代理机构 |
William Park & Associates Ltd. |
代理人 |
William Park & Associates Ltd. |
主权项 |
1. A semiconductor device comprising:
a conductive layer; a plurality of word lines stacked on the conductive layer; a plurality of first channel layers configured to pass through the word lines; and a second channel layer formed in the conductive layer to connect the plurality of first channel layers, and having a higher impurity concentration than the plurality of first channel layers, wherein the conductive layer is configured to surround side and lower surfaces of the second channel layer. |
地址 |
Gyeonggi-do KR |