发明名称 Photoresist composition and resist pattern-forming method
摘要 A photoresist composition includes a polymer that includes a first structural unit shown by a formula (1), and an acid generator. R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2 represents a divalent hydrocarbon group having 1 to 10 carbon atoms. A represents —COO—*, —OCO—*, —O—, —S—, or —NH—, wherein “*” indicates a site bonded to R3. R3 represents a single bond or a divalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably further includes a second structural unit that includes an acid-labile group.;
申请公布号 US9268219(B2) 申请公布日期 2016.02.23
申请号 US201213644708 申请日期 2012.10.04
申请人 JSR Corporation 发明人 Miyata Hiromu;Nakashima Hiromitsu;Yoshida Masafumi
分类号 G03F7/004;G03F7/38;C08F220/28;G03F7/039;G03F7/11;G03F7/20 主分类号 G03F7/004
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A photoresist composition comprising: a polymer that comprises: a first structural unit shown by formula (1);a second structural unit comprising an acid-labile group and shown by formula (2); anda third structural unit comprising a lactone group, a cyclic carbonate group, a sultone group, or a combination thereof, and being other than the first structural unit; and an acid generator,wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, R2 represents a divalent hydrocarbon group having 1 to 10 carbon atoms, A represents —COO—*, —OCO—*, —O—, —S—, or —NH—, wherein “*” indicates a site bonded to R3, and R3 represents a single bond or a divalent hydrocarbon group having 1 to 10 carbon atoms, R3 being bonded to a carbon atom at a position other than a bridgehead position of the 5-oxo-4-oxatricyclo[4.3.1.13,8]undecane structure in the formula (1),wherein R4 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, and R5 to R7 independently represent a linear or branched alkyl group having 1 to 10 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or an aromatic hydrocarbon group having 6 to 20 carbon atoms, or R5 represents a linear or branched alkyl group having 1 to 10 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or an aromatic hydrocarbon group having 6 to 20 carbon atoms, and R6 and R7 taken together represent a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms together with the carbon atom bonded to R6 and R7, wherein a content of the first structural unit in the polymer is from 5 to 30 mol % based on 100 mol % of the polymer, a content of the second structural unit in the polymer is from 30 to 70 mol % based on 100 mol % of the polymer, and a content of the third structural unit in the polymer is from 20 to 60 mol % based on 100 mol % of the polymer.
地址 Tokyo JP
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