| 摘要 |
The present invention relates to a substrate heating device which has multiple heating modules including a processing container for processing a substrate, and an air discharge path common for each heating module, to control an air discharge amount of each heating module with high precision. The substrate heating device comprises: multiple heating modules, each of which includes an air supply port for introducing gas for purge to a process atmosphere in the process container and an air discharge port for discharging the process atmosphere; an individual air discharge path which is connected to each air discharge port; a common air discharge path which is commonly connected to a downstream end of each individual air discharge path; a branch path which is branched from each individual air discharge path and is opened on the outside of the process container; and an air discharge amount adjusting unit which adjusts a flow rate ratio of an exhaust amount from an air discharge port side to the common air discharge path and an introduction amount from the outside of the process container to the common air discharge path through the branch path. Accordingly, fluctuation in a flow rate of gas from each individual air discharge path to the common air discharge path is suppressed. |
