HIGH-RATE DEPOSITING METHOD OF INORGANIC THIN FILM, AND APPARATUS THEREFOR

摘要

The present invention relates to a high-rate deposition method of an inorganic thin film and a manufacturing apparatus for high-rate deposition of the inorganic thin film. Provided is a method for manufacturing an inorganic thin film, which comprises: plasma treating a base material by using a source gas and a reaction gas; and forming an inorganic thin film on the base material as the source gas and the reaction gas react on a surface of the base material.