| 摘要 |
The present invention relates to a rotary gun used in a vacuum evaporation apparatus using plasma. The rotary gun comprises a target material acting as a cathode, a target material driving part which moves the target material, an electromagnet coil which is arranged near the target material and provides an electric field into a vacuum chamber, and a variable type power supply which is connected to the electromagnet coil and provides electric energy. According to this configuration, if a TS distance is changed, a changed TS distance can be corrected by controlling the intensity of the electric field only without breaking a vacuum in the vacuum chamber. |
