| 发明名称 |
IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS |
| 摘要 |
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid. |
| 申请公布号 |
US2016033876(A1) |
申请公布日期 |
2016.02.04 |
| 申请号 |
US201514885775 |
申请日期 |
2015.10.16 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN Hans;STAVENGA Marco Koert;VERSPAY Jacobus Johannus Leonardus Hendricus;JANSSEN Franciscus Johannes Joseph;KUIJPER Anthonie |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
Veldhoven NL |
