| 主权项 |
1. A microfabrication apparatus for fabricating microstructures on a substrate, the apparatus comprising:
a partitioning system arranged to provide an aperture; a particle source forward of the aperture and configured when active to generate a beam of particles for patterning a substrate, the beam directed towards and encompassing the aperture, wherein the partitioning system inhibits the passage of the beam other than through the aperture; a substrate holder configured to support the substrate behind the aperture, thereby exposing the substrate to only those parts of the beam which pass through the aperture; a drive mechanism coupled to the substrate holder and/or the partitioning system; and a controller configured when the particle source is active to control the drive mechanism to effect relative motion between the aperture and the substrate over a portion of the substrate's surface so that different points on the surface portion are exposed at different times, and whilst that motion is ongoing to vary one or more exposure conditions so that the different points are subject to different exposure conditions, those conditions determining the manner in which the substrate is patterned by the beam at those points, thereby fabricating a pattern on the surface portion having one or more spatially varying characteristics. |
