发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 A phosphoric acid aqueous solution in a production tank circulates a circulation system. The circulation system is configured to be switchable between a first state in which the phosphoric acid aqueous solution is circulated through a bypass pipe and a second state in which the phosphoric acid aqueous solution is circulated through a filter. When a silicon containing liquid is supplied to the production tank, the circulation system is switched to the first state. When silicon particles are uniformly dispersed in the phosphoric acid aqueous solution, the circulation system is switched to the second state. Alternatively, a filtration member is provided in the production tank. The silicon containing liquid is stored in the filtration member. The filtration member is dipped in the phosphoric acid aqueous solution stored in the production tank. The silicon containing liquid is permeated through the filtration member, and is mixed with the phosphoric acid aqueous solution.
申请公布号 US2016035597(A1) 申请公布日期 2016.02.04
申请号 US201514812022 申请日期 2015.07.29
申请人 SCREEN Holdings Co., Ltd. 发明人 HINODE Taiki;OTA Takashi;SAITO Kazuhide;NAMBA Toshimitsu;KAMIHIRO Yasukatsu
分类号 H01L21/67;H01L21/311;H01L21/66 主分类号 H01L21/67
代理机构 代理人
主权项 1. A substrate processing apparatus, comprising: a processing liquid producer that produces a processing liquid including silicon and phosphoric acid; a filter arranged to remove impurities in the processing liquid produced by the processing liquid producer; and a processing unit that supplies the processing liquid from which the impurities are removed by the filter to a substrate in order to selectively remove a silicon nitride of a silicon oxide and the silicon nitride on the substrate, wherein the processing liquid producer includes a production tank that stores a first solution including the phosphoric acid, a solution supply system that produces the processing liquid by supplying a second solution including silicon particles to the production tank and mixing the second solution with the first solution, a bypass path that lets the processing liquid flow to bypass the filter, a circulation system that can be switched between a first state in which the processing liquid in the production tank is circulated through the bypass path and a second state in which the processing liquid in the production tank is circulated through the filter, a dispersion state determinator that determines whether the silicon particles in the processing liquid circulated by the circulation system are dipersed to a predetermined degree, and a switcher that switches the circulation system to the first state after supply of the second solution to the production tank by the solution supply system, and switches the circulation system to the second state when the dispersion state determinator determines that the silicon particles are dispersed to the predetermined degree.
地址 Kyoto JP