APPARATUS AND METHOD FOR HOLDING A SUBSTRATE DURING LAYER DEPOSITION IN A VACUUM CHAMBER

摘要

The present disclosure provides a holding arrangement (100) for holding a substrate (10) during layer deposition in a vacuum chamber. The holding arrangement (100) includes a carrier (110) having a support surface (112) configured for supporting the substrate (10); and one or more holding devices (120) provided at the carrier (110). Each each holding device (120) includes at least one rotatable device (122) configured to rotate around a rotation axis (124), wherein the rotation axis (124) is substantially perpendicular to the support surface (112), and wherein the rotatable device (122) has a contact element (126, 526) positioned at a distance from the rotation axis (124) for holding the substrate (10) after rotation.