发明名称 |
Antireflection film and polarizing plate |
摘要 |
An antireflection film is provided which includes stacking in order a transparent base material, a first layer, and a second layer whose refractive index is lower than the refractive index of the first layer. The first layer is formed by curing a coating film containing an ionizing radiation curing material, a quaternary ammonium salt material, and a leveling material. |
申请公布号 |
US9250361(B2) |
申请公布日期 |
2016.02.02 |
申请号 |
US201314036929 |
申请日期 |
2013.09.25 |
申请人 |
TOPPAN PRINTING CO., LTD. |
发明人 |
Yabuhara Yasushi |
分类号 |
G02B1/11;G02B1/116;G02B1/111;G02B5/30 |
主分类号 |
G02B1/11 |
代理机构 |
|
代理人 |
|
主权项 |
1. An antireflection film comprising, stacked in this order:
a transparent base material; a first layer formed by curing a coating film containing an ionizing radiation curing material, a quaternary ammonium salt material, and a fluorine-based leveling material, the leveling material being in an amount within a range of 0.05 to 5.0 parts by mass based on 100 parts by mass of a total of the ionizing radiation curing material, the quaternary ammonium salt material, and the leveling material; and a second layer whose refractive index is lower than a refractive index of the first layer, wherein for a surface of the first layer before formation of the second layer, a micro-indentation hardness obtained when an indentation depth is 100 nm is within a range of 0.45 GPa to 1.0 GPa. |
地址 |
Tokyo JP |