THERMAL ACID GENERATORS FOR USE IN PHOTORESISTS

摘要

Provided is a novel photoresist composition comprising a element comprising a thermal acid generator and a quencher. A preferred photoresist of the present invention comprises: a resin having a photoacid-labile group; a photoacid generator compound; and at least one thermal acid generator and at least one quencher which can function to improve line width roughness and light flux.