| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus which can remove foreign matter on the surface of a photosensitive layer of a workpiece before attaching the foreign matter to the surface of a cylindrical photomask, and in which a defect is hardly generated in a latent image pattern formed on the photosensitive layer due to the foreign matter attached to the surface of the cylindrical photomask.SOLUTION: While moving a workpiece 100 to a direction orthogonal to axial directions of a first adhesive roll 16 and a cylindrical photomask 10, the first adhesive roll 16 is rotated on the surface of a photosensitive layer 104 and the surface of the photosensitive layer 104 is cleaned, by contacting the photosensitive layer 104 with the first adhesive roll 16. By contacting the photosensitive layer 104 of which the surface is cleaned with a cylindrical photomask 10, the cylindrical photomask 10 is rotated on the surface of the photosensitive layer 104, and at the same time, radiation is irradiated from radiation irradiating means 12 arranged inside the cylindrical photomask 10 to the photosensitive layer 104.SELECTED DRAWING: Figure 1 |
