Resist underlayer film forming composition

摘要

A resist underlayer film forming composition including: a polymer having any one or more repeating structural units of Formulas (1a), (1b), and (1c):;
two R1s are each independently alkyl group, alkenyl group, aromatic hydrocarbon group, halogen atom, nitro group, or an amino group, two R2s are each independently hydrogen atom, alkyl group, alkenyl group, acetal group, acyl group, or glycidyl group, R3 is aromatic hydrocarbon group optionally having a substituent, R4 is hydrogen atom, phenyl group, or naphthyl group, in (1b), groups of two R3s and atoms or groups of two R4s are optionally different from each other, two “k”s are each independently 0 or 1, m is integer of 3 to 500, n, n1, and n2 are an integer of 2 to 500, p is integer of 3 to 500, X is a single bond or hetero atom, and two Qs are each independently a structural unit; and solvent.

主权项

1. A resist underlayer film forming composition comprising:
a polymer having any one or two or more of repeating structural units of Formula (1a), Formula (1b), and Formula (1c):in the formulae, two R1s are each independently a C1-10 alkyl group, a C2-6 alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group, or an amino group, two R2s are each independently a hydrogen atom, a C1-10 alkyl group, a C2-6 alkenyl group, an acetal group, an acyl group, or a glycidyl group, R3 is an aromatic hydrocarbon group optionally having a substituent, R4 is a hydrogen atom, a phenyl group, or a naphthyl group; in Formula (1b), groups of two R3s are optionally different from each other, atoms or groups of two R4s are optionally different from each other, two “k”s are each independently 0 or 1, m is an integer of 3 to 500, n, n1, and n2 are an integer of 2 to 500, p is an integer of 3 to 500, X is a single bond or a hetero atom, and two Qs are each independently a structural unit of Formula (2):where two R1s, two R2s, two R3s, two R4s, two “k”s, n1, n2, and X are the same as defined in Formula (1b), and two Q1s are each independently a structural unit of Formula (2); and
a solvent.