Positive resist composition and patterning process

摘要

A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

主权项

1. A positive resist composition comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units (a2) having hydroxy-2,3-dihydro-1,4-anthracenedione group, or recurring units (a1) having a hydroxyanthraquinone group and recurring units (a2) having a hydroxy-2,3-dihydro-1,4-anthracenedione group, represented by the general formula (1), and having a weight average molecular weight of 1,000 to 500,000 as a base resin, wherein R1 and R3 each are hydrogen or a straight, branched or cyclic C1-C6 alkyl, alkoxy or acyloxy group, R2 and R4 each are hydrogen or methyl, m and n each are an integer of 1 to 3, 0≦a1<1.0, 0